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Infrared transmissive silicon phase masks were fabricated at MDL and delivered for testing at the Ames Coronagraph Experiment (ACE) laboratory and at the Subaru Telescope (pictured below). Results showed that the mask performed as intended and future iterations are in development.
Above: Infrared transmissive silicon phase masks were fabricated at MDL and delivered for testing at the Ames Coronagraph Experiment (ACE) laboratory and at the Subaru Telescope (pictured below). Results showed that the mask performed as intended and future iterations are in development.

E-beam Lithography

More Shades of Gray for Deep Sculpted Silicon

Daniel Wilson
Scientists at MDL have developed a deep gray scale electron-beam lithography and plasma etching process for fabricating three-dimensional surface relief profiles in thick polymer resists and silicon substrates. The plasma etching process amplifies the depth of the gray scale e-beam resist pattern and thus can be used to realize shaped silicon structures that are tens of microns deep.

This unique fabrication technique was successfully used to deliver achromatic infrared coronagraph occulting masks designed by Kevin Newman, Olivier Guyon (University of Arizona), and Ruslan Belikov (NASA’s Ames Research Center) for testing at the Ames Coronagraph Experiment (ACE) laboratory as well as the Subaru Telescope, as part of an effort to develop new technologies for planet-finding studies. The initial tests were successful and improved masks are being designed and fabricated.

The gray scale etching technique is also being used as part of a process to fabricate shaped silicon needles for electrospray propulsion thrusters under development at MDL.
Infrared transmissive silicon phase masks were fabricated for testing at the Ames Coronagraph Experiment (ACE) laboratory and at the Subaru Telescope.
Infrared transmissive silicon phase masks were fabricated for testing at the Ames Coronagraph Experiment (ACE) laboratory and at the Subaru Telescope.
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