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Advanced Detectors, Systems, & Nanoscience

The delta-doped detector for JPL’s UVS includes a customized AR coating deposited by Atomic Layer Deposition (ALD). The delta-doped detector for JPL’s UVS includes a customized AR coating deposited by Atomic Layer Deposition (ALD).

Ultraviolet Spectrometer

The Ultraviolet Spectrometer (UVS) project is part of the effort to create a compact, high-performance instrument utilizing several key technologies pioneered at MDL. The first technology is high-performance ultraviolet detectors using delta doping and superlattice doping developed at JPL. The second technology is electron-beam-fabricated gratings on curved substrate enabling compact and efficient optical designs such as a compact Offner imaging spectrometer. The third technology is in the development of tuned optical filters and coatings directly deposited on detectors as well as efficient, high-reflectivity coatings on optical surfaces such as spectrometer mirrors and gratings using ALD. This process enables finer control over spectral parameters and improved optical efficiency. The combination of these technologies in an Offner design is shown in the figure as a laboratory demonstration.

 

Current Projects